Vistec Electron Beam GmbH, a world chief in electron-beam (e-beam) lithography programs, will current its newest developments in e-beam know-how on the 41st European Masks and Lithography Convention (EMLC 2026), happening June 22-24, 2026, on the Volkshaus in Jena, Germany. This 12 months additionally marks a major milestone for Vistec, celebrating 30 years as an organization, constructed upon greater than 60 years of e-beam know-how experience. Over the previous 12 months, Vistec has achieved a number of key developments, together with new buyer installations, expanded world presence, and continued innovation in its core lithography applied sciences. The corporate’s participation at EMLC highlights its progressive developments enabling superior semiconductors, photonics, micro-optics, biosensing MEMS/NEMS, and quantum computing for each industrial and superior analysis purposes.
Superior Electron-Beam Lithography
The corporate’s e-beam lithography programs are based mostly on Vistec’s proprietary Variable Formed Beam (VSB) know-how, which allows high-precision patterning with superior flexibility. In contrast to conventional Gaussian beam programs, which expose options point-by-point, VSB know-how writes variable-sized shapes, which vary from nanometer- to micron-scale, to considerably cut back shot depend and enhance write time. When mixed with superior Cell Projection, which allows repeated and even arbitrary buildings to be uncovered in a single publicity step, Vistec programs ship substantial throughput beneficial properties for purposes with recurring geometries equivalent to photonics, micro-optics and AR/VR waveguides.
Vistec’s VSB platforms present an economical, versatile e-beam lithography answer that maintains excessive decision and sample constancy whereas supporting a broader vary of purposes, significantly in high-mix/low-volume manufacturing environments. The corporate’s platforms additionally assist 300-mm wafer writing, positioning them for each superior analysis and industrial manufacturing. One other key differentiator is Vistec’s proprietary ePLACE information preparation software program, which streamlines information processing workflows and optimizes publicity methods, together with Cell Projection, for its VSB programs.
New Buyer Engagements and Milestones
In Japan, Vistec just lately accomplished the set up of an SB255 VSB system within the Takeda Sentanchi Tremendous Cleanroom at The College of Tokyo (UTokyo) as a part of the Superior Analysis Infrastructure for Supplies and Nanotechnology – Semiconductor Expertise Infrastructure Initiative (ARIM-SETI). The Takeda Sentanchi Tremendous Cleanroom is operated by Platform Machine Analysis Division, Programs Design Lab (d.lab), Graduate Faculty of Engineering, UTokyo. A high-resolution, common and cost-effective device supporting each direct write and masks making purposes, the Vistec SB255 allows UTokyo to realize broader entry to superior purposes. As well as, this set up represents a major step in rising Vistec’s presence within the strategically vital Japanese market. UTokyo companions with each Vistec, a member of the HEIDENHAIN Company Group, and HEIDENHAIN Ok.Ok. (Japan) as key trade suppliers to assist precision analysis, supplies science, and semiconductor lithography training.
As well as, Vistec has seen sturdy adoption throughout compound semiconductor foundries, with a double-digit variety of system installations supporting superior system manufacturing. In the US, Vistec will provide an e-beam lithography system to a significant know-how innovator for a complicated analysis undertaking, additional highlighting the increasing function of e-beam know-how in next-generation system innovation. Extra buyer engagements in Europe additional mirror rising demand for versatile, high-resolution lithography options.
In Taiwan, Vistec has maintained a robust regional presence for greater than 20 years, supported by its native subsidiary, Vistec Electron Expertise Co. Ltd., which offers devoted area service engineering assist to prospects all through the area. The corporate additionally works intently with its gross sales consultant, Scientech Company, to assist buyer engagement and enterprise improvement throughout the Taiwanese market. Vistec continues to develop its footprint with the continued set up of a 300-mm e-beam lithography system on the Taiwan Semiconductor Analysis Institute (TSRI), working below the Nationwide Institutes of Utilized Analysis (NIAR), following the profitable set up of a
200-mm system final 12 months. Vistec additionally serves prospects in Taiwan’s compound semiconductor foundry market.
“With a heritage spanning greater than 60 years, we proceed to construct on our fame as an e-beam skilled, delivering options that bridge superior analysis and industrial-scale purposes,” mentioned Matthias Slodowski, Basic Supervisor at Vistec Electron Beam GmbH. “Pushed by growing demand for photonics, superior semiconductor units, and specialised manufacturing processes, the necessity for versatile, high-precision lithography options continues to develop. Our world-class VSB lithography platforms with seamless built-in Cell Projection know-how present the improved throughput, precision, flexibility, excessive automation and manufacturing effectivity to satisfy these wants. At present, e-beam know-how is a essential enabler of future innovation for tomorrow’s superior units, and we’re excited to showcase our newest know-how developments and utility experience at EMLC 2026.”
Shows at EMLC 2026
Vistec is taking part within the EMLC program with the next talks:
- “E-beam Cell Projection for 3D Blazed Gratings and Curvilinear Options” (Session 4: Wafer Lithography and Patterning, Monday, June 22, 17:20-17:40)
- “Position of Form Approximation in Figuring out Waveguide Properties Utilizing Variable-shaped E-beam Lithography” (Session 4: Wafer Lithography and Patterning, Monday, June 22, 17:40-18:00) – co-authored with Fraunhofer Institute for Utilized Optics and Precision Engineering, Friedrich Schiller College and Max Planck Faculty of Photonics
- “Stacked Grayscale Lithography Utilizing Intra-level E-beam Publicity on Latent Resist Picture of i-line Buildings Utilizing Specialised Information Preparation Strategies” (Session 10: Novel Lithographic Applied sciences / Direct Write Lithography and Patterning, Poster Shows, P-3, Tuesday, June 23, 16:30 to 18:20) – co-authored with Fraunhofer Institute for Digital Nano Programs and Technische Universität Chemnitz (the Chemnitz College of Expertise)
Attendees at EMLC 2026 are invited to attach with Vistec to study extra about its newest know-how developments. Contact Ines Stolberg, Supervisor Advertising & Gross sales at: [email protected].